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Behavior of alloying elements during anodizing of Mg-Cu and Mg-W alloys in a fluoride/glycerol electrolyte

  • Autori: Palagonia, M.; Němcová, A.; Kuběna, I.; Šmíd, M.; Gao, S.; Liu, H.; Zhong, X.; Haigh, S.; Santamaria, M.; DI QUARTO, F.; Habazaki, H.; Skeldon, P.; Thompson, G.
  • Anno di pubblicazione: 2015
  • Tipologia: Articolo in rivista (Articolo in rivista)
  • Parole Chiave: Electrochemistry; Electronic, Optical and Magnetic Materials; Materials Chemistry2506 Metals and Alloys; Surfaces, Coatings and Films; Renewable Energy, Sustainability and the Environment; Condensed Matter Physics
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Anodizing of sputtering-deposited magnesium and Mg-0.75at.%Cu and Mg-1.23at.%W alloys has been carried out in a fluoride/ glycerol electrolyte. The aims of the study were to investigate the enrichment of alloying elements in the alloy immediately beneath the anodic film and the migration of alloying element species in the film. The specimens were examined by electron microscopy and ion beam analysis. An enrichment of copper is revealed in the Mg-Cu alloy that increases with the anodizing time up to ∼6×1015 Cu atoms cm-2. Copper species are then incorporated into the anodic film and migrate outwards. In contrast, no enrichment of tungsten occurs in the Mg-W alloy, and tungsten species are immobile in the film.