Salta al contenuto principale
Variability of the Si–O–Si angle in amorphous-SiO2 probed by electron paramagnetic resonance and Raman spectroscopy
- Autori: Buscarino, G; Vaccaro, G; Agnello, S; Gelardi, FM
- Anno di pubblicazione: 2009
- Tipologia:
Articolo in rivista
(Articolo in rivista)
- Parole Chiave: Raman scattering, Microwave
Radiation effects, Magnetic properties, Raman spectroscopy, Silica, Radiation, Electron spin resonance, Defects
- OA Link: http://hdl.handle.net/10447/44521
