Resist Coating of Cylindrical Samples for 3-D Lithography
- Autori: Giaconia G.C.; Grasso G.; Arnone C.
- Anno di pubblicazione: 1995
- Tipologia: Articolo in rivista
- OA Link: http://hdl.handle.net/10447/425921
Abstract
A quantitative investigation of a dipping technique for depositing a thin layer of resist on circularly symmetrical objects is presented. The results obtained are valuable for preparing three-dimensional (3-D) surfaces suited for spatial microlithographic processes in the 1 to 10 μm linewidth range. © 1995, MCB UP Limited