Photo-oxidation Behaviour of EVA Antimicrobial Films
- Autori: Botta, L.; Scaffaro, R.; La Mantia, F.P.
- Anno di pubblicazione: 2010
- Tipologia: Contributo in atti di convegno pubblicato in volume
- OA Link: http://hdl.handle.net/10447/56257
Abstract
In this work the photo‐oxidation of neat EVA and antimicrobial EVA/Nisin films was studied. Two EVA samples—containing two different vinyl acetate levels—were added with different amounts of nisin. The influence of the matrix type and of the nisin content on the photo‐oxidation behaviour was evaluated. The photo‐oxidation has been followed by monitoring the change of the mechanical and spectroscopic properties upon artificial exposure to UV‐B light. The results revealed that the films incorporating nisin show a better photo resistance with respect to the neat polymer. This improvement becomes weaker with decreasing the amount of nisin incorporated. Moreover the EVA 28 based films showed a much slower photo‐oxidation rate in comparison with the EVA 14 based ones.